The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2004

Filed:

Aug. 17, 2001
Applicant:
Inventors:

Martin Wildeman, Spartanburg, SC (US);

Jeffrey Carpenter, Columbus, NC (US);

Glenda Carpenter, Columbus, NC (US);

Assignee:

Tietex International, Ltd., Spartanburg, SC (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D03D 2/700 ;
U.S. Cl.
CPC ...
D03D 2/700 ;
Abstract

A fabric material having a textured surface and a process for producing the fabric material are disclosed. The fabric material is made from a woven fabric substrate including a warp yarn and at least first and second pick yarns. The first pick yarn is woven into the fabric substrate to provide integrity. The second pick yarn, on the other hand, is a yarn that is nappable from the surface of the fabric substrate. In accordance with the present invention, the fabric substrate is fed through a napping process which naps the second pick yarn appearing on the face of the fabric. The fabric substrate is then fed through a shearing process which shears the napped yarns. The napped and sheared yarns form pile-like tufts on the surface of the fabric. Ultimately, the napped and sheared yarns produce a velvet-like fabric having an improved aesthetic appearance.


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