The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Aug. 27, 2003
Kazuya Kitamura, Tenri, JP;
Kuniaki Okada, Tenri, JP;
Yoshihiro Sekimoto, Soraku-gun, JP;
Yukio Kurata, Tenri, JP;
Hiroshi Nakanishi, Yawata, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
An exposing apparatus for a microlens array allows for easy alignment and attains high accuracy. An exposing method for a microlens array attains high accuracy and high light efficiency. The exposing apparatus for a microlens array includes a micro fly-eye lens for converting a light beam from a light source into a secondary point light source, a transmittance distribution mask for adjusting the luminance of the light of the secondary point light source, and a collimator lens for converting the light of adjusted luminance into a parallel light beam and for guiding the parallel light beam, via a first microlens array which is formed in advance, to a photosensitive resin layer to be a second microlens array. The light emitted from the light source is transmitted through the micro fly-eye lens, the transmittance distribution mask, and the collimator lens. The light is then adjusted to a desired luminance to expose the photosensitive resin of a microlens substrate.