The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Nov. 13, 2001
Shinichi Shima, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a projection optical system for projecting a pattern, which has been formed on a reticle, onto a photosensitive substrate, wherein a projection region of the pattern, which region is formed on the substrate via the projection optical system, is formed at a position that is off-centered with respect to an optical axis of the projection optical system, a substrate stage capable of holding and moving the substrate, a substrate transport system for transporting the substrate to the substrate stage, wherein the substrate transport system is disposed on the side of the projection region with respect to the optical axis, and the substrate transport system and the substrate stage are arranged in a divided space which is purged with inert gas, and a position detection system for detecting an alignment mark on the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile