The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 23, 2004

Filed:

Dec. 26, 2002
Applicant:
Inventors:

Satoru Kaneko, Kumagaya, JP;

Toshiyuki Ohkoda, Oizumi-machi, JP;

Takao Myono, Menuma-machi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/976 ; H01L 2/994 ;
U.S. Cl.
CPC ...
H01L 2/976 ; H01L 2/994 ;
Abstract

A semiconductor device for a charge pump device suitable for providing large current capacity and preventing a latch up from occurring is offered. An N-type epitaxial silicon layer is formed on a P-type single crystalline silicon substrate, and a P-type well region is formed in the N-type epitaxial silicon layer. A P+-type buried layer abutting on a bottom of the P-type well region and an N+-type buried layer partially overlapping with the P+-type buried layer and electrically isolating the P-type well region from the single crystalline silicon substrate are formed. And then, an MOS transistor is formed in the P-type well region.


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