The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Jul. 09, 2001
Abstract
A method for materials processing by means of plasma-inducing high-energy radiation, especially laser radiation, in which the instantaneous intensity of the plasma radiation is measured at plural locations of a vapor capillary. So that the method can also be performed with perfect welding results on workpieces of very small thickness, shapes of two spaced-apart peak intensity regions, or of another type of electromagnetic radiation emitted from the vapor capillary, and of a minimum region that can be formed between these two regions of extreme values are detected metrologically, the so detected shapes of the regions of extreme values are compared with predetermined region shapes, and control of the materials processing operation takes place as a function of deviations of the detected shapes from the predetermined region shapes.