The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Dec. 20, 2001
Didier Letourneur, Samoreau, FR;
Charles M. Sorensen, Jr., Corning, NY (US);
Pierre Woehl, Cesson, FR;
Corning Incorporated, Corning, NY (US);
Abstract
A method is disclosed for maintaining a volumetric gas to liquid ratio in a segmented gas/liquid flow along a reactor of monolithic catalyst beds in series. The present invention includes the steps of: initiating the segmented gas/liquid flow at a first end of the reactor by introducing feed liquid and feed gas both at a predetermined volume and a predetermined flow rate; injecting an additional amount of gas at least once into any of the spaces between catalyst beds; and combining the segments of the segmented gas/liquid flow at a second end of the reactor. The injection of gas is controlled such that the segmented gas/liquid flow can be maintained near or at the Taylor regime.