The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Jul. 14, 2000
Applicant:
Inventors:
Hiromichi Ohta, Tokyo, JP;
Masahiro Orita, Tokyo, JP;
Assignee:
Hoya Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B32B 1/900 ;
U.S. Cl.
CPC ...
B32B 1/900 ;
Abstract
A low-resistance ITO thin film having a resistivity on the order of, or lower than 10 &OHgr;cm, and a method for manufacturing such a film are disclosed. The ITO thin film is manufactured by depositing ITO on a crystalline substrate by pulsed laser deposition, low-voltage sputtering, oxygen cluster beam deposition, chemical vapor deposition, metal organic chemical vapor deposition, metal organic chemical vapor deposition—atomic layer deposition, or molecule beam epitaxy.