The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Mar. 26, 2002
Applicant:
Inventors:
Javier Villarreal, Cambridge, MA (US);
Susan A. Alie, Stoneham, MA (US);
Assignee:
Analog Devices, Inc., Norwood, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/404 ;
U.S. Cl.
CPC ...
C23C 1/404 ;
Abstract
A shadow mask material is selected so that the expansion characteristics of the shadow mask during thin film deposition closely match the expansion characteristics of the substrate. The shadow mask material is typically one with a low coefficient of thermal expansion (CTE). The shadow mask material must typically meet additional criteria, such as mechanical strength, feature quality, and dimensional accuracy criteria.
Quick Actions:
Villarreal, Javier. (2004). Method for thin film deposition matching rate of expansion of shadow mask to rate of expansion of substrate (U.S. Patent No. 6821561). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6821561
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile