The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2004
Filed:
Feb. 12, 2002
Ryo Takai, Tochigi, JP;
Kazunori Iwamoto, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
To accurately measure the position and posture of a stage apparatus used in an exposure apparatus or the like, the Z position and displacement of a top stage ( ) are measured using as a reference a lens barrel support ( ) independently of the top stage in terms of vibrations by an interferometer system which includes a projection optical system ( ) for projecting a pattern formed on a master onto a substrate, stages ( ) capable of moving with respect to the projection optical system ( ) while holding the substrate or master, and a lens barrel support ( ) that supports the projection optical system ( ), and which uses a Z measuring mirror ( ) that is arranged on a Y stage ( ) and has a reflecting surface almost parallel to the XY plane, and a Z interferometer ( ) arranged on the Y stage ( ).