The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2004

Filed:

Jul. 24, 2002
Applicant:
Inventor:

Osamu Ogawa, Tochigi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/732 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/732 ; G03C 5/00 ;
Abstract

An exposure apparatus which operates based on a set of parameters contained in a parameter file. The apparatus includes an acquiring section which acquires a first parameter file containing a first set of parameters, a converting section which converts the first parameter file acquired by the acquiring section into a second parameter file containing a second set of parameters, the second set of parameters corresponding to a version of a software used in the exposure apparatus, and a setting section which sets a value of a parameter contained in the second parameter file obtained by the converting section, based on a configuration file which describes a value of the parameter contained in the second parameter file.


Find Patent Forward Citations

Quick Actions:

Ogawa, Osamu. (2004). Exposure apparatus and control method therefor, and semiconductor device manufacturing method (U.S. Patent No. 6819398). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6819398

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…