The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2004
Filed:
Nov. 15, 2002
Duane B. Barber, Camas, WA (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
A method for leveling an exposure field of view at a peripheral edge of a substrate. The field of view is aligned to a first position at the peripheral edge of the substrate, where the field of view has an inner edge and an outer edge, relative to the peripheral edge of the substrate. Whole device patterns within the field of view are identified, and the alignment of the field of view is altered to a second position so as to place the outer edge of the field of view adjacent the whole device patterns within the field of view. Level measurement information from the field of view at the second position is acquired and stored. The field of view is realigned to the first position, and the substrate is leveled within the field of view at the first position using the level measurement information acquired from the field of view at the second position.