The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2004
Filed:
Feb. 11, 2004
Applicant:
Inventors:
Andreas V. Tsangaris, Ottawa, CA;
George W. Carter, Ottawa, CA;
Jesse Z. Shen, Ottawa, CA;
D. Michael Feasby, Ottawa, CA;
Kenneth C. Campbell, Kitchener, CA;
Assignee:
RCL Plasma, Inc., Gloucester, CA;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65B 1/04 ;
U.S. Cl.
CPC ...
B65B 1/04 ;
Abstract
A waste processing system is provided herein which entails the use of at least one fixed-position plasma arc generator for primary processing and at least one moveable plasma arc generator for secondary processing assistance and/or final conditioning of the slag prior to exit from the reactor vessel. This optimum processing environment is provided by control of reactor vessel configuration and real time control of processing characteristics to ensure maximum processing efficiency.