The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2004
Filed:
Feb. 16, 2000
Paul Reimer, Los Altos, CA (US);
Pedram Sabouri, Santa Clara, CA (US);
Dennis Smith, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An apparatus for processing a substrate , comprises an integrated pumping system having a high operating efficiency, small size, and low vibrational and noise levels. The apparatus comprises a chamber, such as a load-lock chamber , transfer chamber , or process chamber . An integrated pump is abutting or adjacent to one of the chambers for evacuating gas from the chambers. In operation, the pump is located within the actual envelope or footprint of the apparatus and has an inlet connected to a chamber , and an outlet that exhausts the gas to atmospheric pressure. Preferably, the integrated pump comprises a pre-vacuum pump or a low vacuum pump and is housed in a noise reducing enclosure having means for moving the pump between locations and means for stacking pumps vertically in use.