The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2004
Filed:
Aug. 02, 2002
Tetsuya Oshino, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
X-ray projection-exposure apparatus are disclosed that achieve a higher accuracy of pattern overlay than conventionally. An embodiment of such an apparatus includes an X-ray source, an illumination-optical system for irradiating an X-ray beam from the X-ray source onto a mask defining a pattern, a mask stage for holding the mask, a projection-optical system for directing the patterned beam from the mask to project an image of the pattern onto a resist-coated wafer, a wafer stage for holding the wafer, and a mark-position-detection system for detecting the position of a mark formed on the wafer. The center of an exposure-image field of the projection-optical system is located at a position displaced from the center axis of the projection-optical system, and the center axis of the mark-position-detection system is located laterally adjacent the exposure-image field with respect to the center axis of the projection-optical system.