The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2004

Filed:

Jul. 12, 2002
Applicant:
Inventors:

Kurt Nattermann, Ockenheim, DE;

Ewald Moersen, Mainz, DE;

Assignee:

Schott Glas, Mainz, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 7/00 ; G02B 5/30 ;
U.S. Cl.
CPC ...
G02B 7/00 ; G02B 5/30 ;
Abstract

The optical system has a first optical element ( ) and a second optical element ( ) having respective plane surfaces and cubic crystal structures, which are arranged next to each other along an optic axis ( ) so that one of the crystal axes of each optical element is parallel to the optic axis and the plane surfaces are resting against each other. The first and second optical elements have first and second orientations in relation to the optic axis, which are preferably rotated by a rotation about the optic axis ( ) with respect to each other according to the rotational symmetry of the material. At least one of the first optical element and second optical element is pre-stressed by applying a compressive stress (&sgr;,&sgr;, ) thereto. The compressive stress is applied radially symmetrically in a plane perpendicular to the optic axis ( ) and compensates for spatial dispersion.


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Nattermann, Kurt. (2004). Optical system with compensated spatial dispersion (U.S. Patent No. 6816326). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6816326

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