The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2004
Filed:
May. 22, 2002
Applicant:
Inventor:
Zhi Yuan Wang, Ottawa, CA;
Assignee:
TWLinks Inc., Ottawa, CA;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 7/900 ;
U.S. Cl.
CPC ...
C08G 7/900 ;
Abstract
The invention provides generally a new type of organic electrochromic Near Infrared (NIR)-active materials capable of absorbing and attenuating the light in the NIR region around 1550 nm and forming thin films on electrodes for variable optical attenuator (VOA) applications. They have utility in planar VOA devices. The materials are ruthenium complexes. Unsymmetrical complexes having two different substituents are disclosed, where one substituent is more electron-donating than the other. Complexes which are dimers or trimers (symmetrical or unsymmetrical) are disclosed, as are polymeric complexes. Crosslinked polymeric complex films are also disclosed.