The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2004
Filed:
Oct. 15, 2001
Applicant:
Inventors:
Ki-deok Bae, Kyungki-do, KR;
Yong-seop Yoon, Seoul, KR;
Assignee:
Samsung Electronics Co., Ltd., Kyungki-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
A method of fabricating micro-electromechanical system (MEMS) structures that can prevent stiction between a microstructure and a substrate or adjacent structures after etching for releasing the microstructure is provided. In a micromaching process for fabricating a microstructure suspended above a substrate using a sacrificial layer, the fabricating method includes stacking an anti-stiction layer, which can be removed by dry etching, before or after stacking a sacrificial layer.
Bae, Ki-deok. (2004). Method of fabricating anti-stiction micromachined structures (U.S. Patent No. 6815361). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6815361
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile