The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2004
Filed:
Nov. 26, 2002
Gary K Jones, Austin, TX (US);
Christopher A Bode, Austin, TX (US);
Richard D Edwards, Austin, TX (US);
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
A method includes measuring a first overlay error between a first process layer and a second process layer using a first overlay target formed on the second process layer. A second overlay error between the first process layer and a third process layer is measured using a second overlay target formed on the third process layer. At least one parameter of an operating recipe for performing a photolithography process on the first process layer is determined based on the first and second overlay error measurements. A system includes a metrology tool and a controller. The metrology tool is configured to measure a first overlay error between a first process layer and a second process layer using a first overlay target formed on the second process layer and measure a second overlay error between the first process layer and a third process layer using a second overlay target formed on the third process layer. The controller is configured to determine at least one parameter of an operating recipe for performing a photolithography process on the first process layer based on the first and second overlay error measurements.