The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2004
Filed:
Mar. 11, 2003
Hirofumi Higashi, Yamanashi-ken, JP;
Shingo Ogane, Yamanashi-ken, JP;
Other;
Abstract
Provision of a manufacturing method for forming lamination of a plurality of dielectric layers on a substrate of a plasma display panel. A forming process for forming a photosensitive glass material layer and a patterning process for exposing required regions of the resulting photosensitive glass material layer to light are repeated in each formation of a first photosensitive glass material layer L and a second photosensitive glass material layer L . After completion of the individual forming process and the individual patterning process for each of the first and second photosensitive glass material layers L and L , a developing process for removing the unexposed regions and a burning process following the developing process are each performed on both of the first and second photosensitive glass material layers L and L together.