The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2004

Filed:

Sep. 22, 1999
Applicant:
Inventors:

Paul David Tatarka, Woodridge, IL (US);

Paul Nick Georgelos, Naperville, IL (US);

Scott Allan Idlas, Downers Grove, IL (US);

Assignee:

Curwood, Inc., Oshkosh, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 2/700 ; C08L 3/300 ;
U.S. Cl.
CPC ...
B32B 2/700 ; C08L 3/300 ;
Abstract

A polymer blend and mono-and multilayer films made therefrom suitable for processing or packaging articles which have an improved combination of properties e.g. such as lower tear strength and higher puncture resistance, or higher puncture resistance at both room temperature in air and at elevated temperatures in contact with water wherein the blend preferably has a first copolymer of ethylene and hexene-1 having a copolymer melting point of 80 to 98° C., preferably of 80 to 92° C.; a second copolymer of ethylene and at least one &agr;-olefin having a copolymer melting point of 115 to 128° C.; and a third copolymer of ethylene and a vinyl ester or alkyl acrylate and having a melting point of 60 to 110° C., and a process for making such films, especially shrink films having at least 40% shrink at 90° C. in at least one direction.


Find Patent Forward Citations

Tatarka, Paul. (2004). Puncture resistant polymeric films, blends and process (U.S. Patent No. 6815023). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6815023

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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