The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2004
Filed:
Apr. 16, 2003
Louis J. Hendzel, Owego, NY (US);
Lockheed Martin Corporation, Bethesda, MD (US);
Abstract
A material deflector plate system adapted for mounting below the forwardly declining surface of a material-guiding discharge chute includes a base frame for mounting rearwardly of the discharge edge of the declining surface and a deflector-plate support structure reciprocably depending from the base frame for reciprocation between rearwardmost and forwardmost positions. Hingedly depending from the support structure are alternatively collapsible and deployable first and second deflector plate sets. The system can alternatively assume storage and operative attitudes. A storage attitude is one in which the deflector plate sets are collapsed and the support structure is disposed sufficiently rearwardly with respect to the base frame that at least a majority of the length of the collapsed deflector plate sets is disposed rearwardly of the chute discharge edge. An operative attitude is one in which the deflector plate sets are in upright positions in which they extend above the chute discharge edge to channel material exiting the chute into a material acceptance region defined to the interior of the deployed deflector plates.