The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2004
Filed:
Jun. 11, 2002
Applicant:
Inventors:
Mark Oskotsky, Mamaroneck, NY (US);
Lev Ryzhikov, Norwalk, CT (US);
Scott Coston, New Milford, CT (US);
James Tsacoyeanes, Southbury, CT (US);
Walter Augustyn, Monroe, CT (US);
Assignee:
Other;
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/754 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/754 ;
Abstract
A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.