The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2004
Filed:
May. 17, 2001
Kohei Arakawa, Shizuoka-ken, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
The present invention provides a broad band retardation plate that can be fabricated by a simple process and uniformly retards light incident of the entire visible light region. The retardation plate contains materials including positive or negative intrinsic double refraction values. When retardation values in wavelengths of 450 nm, 550 nm, and 650 nm are defined as Re(450), Re(550) and Re(650), respectively, the retardation plate satisfies the relational expression of Re(450)<Re(550)<Re(650). The retardation plate has a first layer comprising a positive material and a second layer comprising a negative material. The first layer and second layers have double refraction, and are laminated such that lag axes of the both layers are orthogonally crossed. It is preferable that the positive material is a norbornene based polymer and the like.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile