The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2004

Filed:

Mar. 14, 2000
Applicant:
Inventors:

Daniel Sievenpiper, Los Angeles, CA (US);

Robin Harvey, Newbury Park, CA (US);

Assignee:

HRL Laboratories, LLC, Malibu, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 1/510 ;
U.S. Cl.
CPC ...
H01Q 1/510 ;
Abstract

A radio frequency aperture comprising a plurality of insulating layers disposed in a stack, each layer including an array of conductive regions, the conductive regions being spaced from adjacent conductive regions. Also disclosed is method of bending or steering radio frequency waves impinging an antenna. The method includes disposing a plurality of insulating layers arranged in a stack between a source of the radio frequency waves and the antenna, wherein each insulating layer includes an array of conductive regions, the conductive regions being spaced from adjacent conductive regions and forming capacitive elements. The capacitance of the capacitive elements in the plurality of insulating layers is adjusted as a function of their location in the plurality of insulating layers.


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