The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2004
Filed:
May. 24, 2001
Applicant:
Inventor:
Sheng Sun, Fremont, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 ;
U.S. Cl.
CPC ...
B08B 7/00 ;
Abstract
Provided herein is a method for cleaning a process chamber by employing high power density light beam(s) to assist dissociating cleaning gaseous species at the cleaning site. Also provided herein is a method for cleaning the process chamber with laser ablation, wherein no cleaning gas is necessary.
Sun, Sheng. (2004). Photo-assisted chemical cleaning and laser ablation cleaning of process chamber (U.S. Patent No. 6811615). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6811615
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile