The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2004
Filed:
Mar. 06, 2003
Hiroaki Watanabe, North Kingstown, RI (US);
Hiroyuki Inoue, Otsu, JP;
Toray Plastics America, Inc., North Kingstown, RI (US);
Abstract
A former is used to manufacture a bag in a packaging machine. The radius of curvature of the former top along a film guiding direction is between 0.27 mm and 0.50 mm, the average surface roughness of the former top is less than 10 &mgr;m, and the number of high projections per unit length of 10 mm of the former top along a width direction of the film guided by the collar into the cylinder. The high projection is defined as a projection of the surface of the former top that is as tall as or taller than 5 times the average surface roughness of the former top. It is found that the minimum radius of curvature of the former top should be equal to or larger than the critical radius that is defined by a radius of the curvature which causes an elastic limit strain at an innermost portion of a support layer of a laminated film immediately outside a barrier layer of the laminated film when the laminated film is bent over the former top. This makes it possible to effectively avoid undesired increase in oxygen transmission of the bag made of the laminated film.