The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2004

Filed:

May. 12, 2000
Applicant:
Inventors:

Melvin A. Park, Billerica, MA (US);

Houle Wang, Billerica, MA (US);

Assignee:

Bruker Daltonics, Inc., Billerica, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 5/944 ; B01D 4/900 ; B01D 4/926 ; H01J 4/940 ;
U.S. Cl.
CPC ...
B01D 5/944 ; B01D 4/900 ; B01D 4/926 ; H01J 4/940 ;
Abstract

The present invention is for an improved ionization source chamber and ion beam delivery system which includes a vacuum chamber and flange arrangement, for mounting the means for transferring sample ions from the port to a mass analyzer and for mounting the ion production means, respectively. The flange containing the ion production means may be attached to the vacuum chamber via a hinge such that the flange can open as a door to provide easy access to the ion transfer electrodes in the vacuum chamber. Further, a variety of different ion production means may be mounted on the flange of the ionization source chamber of the present invention. As a result, any ion production means may be used with the present invention by substituting a flange which includes the desired ion production means.


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