The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2004
Filed:
Jul. 25, 2002
Applicant:
Inventor:
Yih-Lin Chung, Daan Chiu, Taipei, TW;
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K 3/119 ; A61K 3/120 ; A61K 7/48 ; A61K 7/42 ; A61K 7/44 ;
U.S. Cl.
CPC ...
A61K 3/119 ; A61K 3/120 ; A61K 7/48 ; A61K 7/42 ; A61K 7/44 ;
Abstract
Compounds of a histone deacetylase inhibitor. The compounds are capable of simultaneously stimulating epithelium regrowth, inhibiting cutaneous fibroblast proliferation, decreasing collagen deposit, suppressing fibrogenic growth factor and subsiding inflammatory cytokine, and are useful inhibiting the main features of radiation cutaneous syndrome. Results include a decrease in skin swelling, promotion of epithelium healing, and prevention of cutaneous fibrosis, ulceration and necrosis. The present invention provides methods of treating, preventing or ameliorating radiation-induced skin damage by administering a therapeutically effective amount of a histone deacetylase inhibitor.