The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2004

Filed:

Nov. 19, 2002
Applicant:
Inventors:

Yuichi Ohga, Kanagawa, JP;

Tadashi Enomoto, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 3/06 ;
U.S. Cl.
CPC ...
C03C 3/06 ;
Abstract

A process for producing fluorine-containing glass. An SiO soot is synthesized by hydrolyzing SiCl . The soot is heated in a chlorine-compound-free atmosphere containing a fluorine compound gas to form a fluorine-containing silica glass. The glass contains not more than 10 ppm OH group, not more than 10 ppm Cl, and not less than 1,000 ppm F. The concentration ratio of F/Cl is 10,000 or more.


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