The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2004
Filed:
Oct. 24, 2002
Applicant:
Inventor:
John M. Dobbs, Hamilton, MA (US);
Assignee:
Analogic Corporation, Peabody, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/00 ;
U.S. Cl.
CPC ...
G21K 1/00 ;
Abstract
A method for manufacturing an anti-scatter grid having a desired height. The method includes positioning a bottom surface of a mask of dielectric material, with a depth at least equal to the desired height of the anti-scatter grid, on a sheet of metal, cutting first and second series of intrinsically focused slots through a top surface of the mask to the sheet of metal, plating the sheet of metal at the bottom of each of the slots of the mask with a radiopaque material to form partition walls of the anti-scatter grid, and continuing to plate the radiopaque material into the slots of the mask until the desired height of the anti-scatter grid is achieved.