The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2004
Filed:
Mar. 29, 2002
Si Youn Kim, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A semiconductor device capable of preventing a ring defect and a method of manufacturing the same are provided. The semiconductor device includes a semiconductor substrate having a junction region, a planarization layer having a first contact hole portion through which the junction region is exposed, an interlayer dielectric layer formed on the planarization layer and having a second contact hole portion extended from the first contact hole portion, and contact spacers formed at the sidewalls of the first and second contact hole portions. Here, the contact spacers are formed to cover the interface between the planarization layer and the interlayer dielectric layer and the interface between the planarization layer and the semiconductor substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile