The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2004

Filed:

May. 15, 2002
Applicant:
Inventors:

Kelwin Ko, San Jose, CA (US);

Chi Chang, Redwood City, CA (US);

Assignee:

Advanced Micro Devices, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/18238 ;
U.S. Cl.
CPC ...
H01L 2/18238 ;
Abstract

A method and system for providing a semiconductor device are described. The method and system include providing a plurality of gate stacks and a first source drain halo implant. The first source and drain halo implant uses the plurality of gate stacks as a mask. The method and system also include providing a lightly doped source and drain implant and a N+ source and drain implant. The source connection implant is for connecting a portion of the plurality of sources. The second source and drain implant uses the plurality of gate stacks as a mask. Moreover, CoSi formed on the source region provides a lower resistence for lines connecting the sources, allowing a lower dose to be used for the N+ source and drain implant.


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