The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2004
Filed:
Jun. 10, 2003
Ting Tsui, Plano, TX (US);
Andrew John McKerrow, Dallas, TX (US);
Yuji Richard Kuan, Richardson, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present invention provides, in one embodiment, process of treating a target semiconductor surface. The process includes exposing a test surface to a plasma protocol ( ), and measuring chemical changes in discrete locations of the test surface ( ). The process further includes preparing a target surface by exposing the target surface to the plasma protocol ( ) when a uniformity of the chemical changes are within a performance criterion of the plasma protocol ( ). Other embodiments advantageously incorporate this process into methods for making semiconductor devices and integrated circuits.