The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2004
Filed:
Feb. 11, 2003
Christopher Formato, Brentwood, CA (US);
Jing Gui, Fremont, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A dual-sided stamper/imprinter for simultaneously forming magnetic transition patterns in spaced-apart first and second layers of magnetic material by contact printing comprises a mechanically hard, substantially rigid magnetic material having high saturation magnetization and high permeability and including first and second oppositely facing imprinting surfaces, wherein each of the imprinting surfaced has a topographical pattern formed therein comprising a patterned plurality of spaced-apart recesses with a plurality of non-recessed areas therebetween, each topographical pattern corresponding to a magnetic transition pattern to be formed in a respective layer of magnetic material. Also disclosed is a method for manufacturing dual-sided stampers/imprinters.