The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2004
Filed:
Nov. 07, 2001
Luisa DeMorais Santos, Franklin, MA (US);
Deirdre E. Townes, Newton, MA (US);
Gabriel R. Patricio, Stafford, VA (US);
Carole Ann Winterhalter, Marlborough, MA (US);
Anabela Dugas, Fall River, MA (US);
Timothy R. O'Neill, Fall River, VA (US);
Rosemary Ann Lomba, Westport, MA (US);
Barbara J. Quinn, Framingham, MA (US);
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
A disruptive camouflage pattern system to be used for both military and civilian applications. The system includes specialized techniques for printing the camouflage pattern system unto fabric. The system provides camouflage in both the human visible light and the near infrared range. The system depends on macro pattern resulting from a repeat of a micro pattern. The coloring used includes at least four colorings from dyes that in combination produce a percent reflectance value comparable to that of the negative space of the camouflaged subject's surroundings. The system functions by a macro pattern being disruptive of the subject's shape and a micro pattern having sharp edge units of a size capable of blending the subject into its background. The relative lightness values and percentages of total pattern, wet or dry, are sufficient to produce a percent reflectance of acceptable colors, in terms of lightness values unlike current four-color camouflage.