The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2004
Filed:
Sep. 28, 2001
John C. Tsai, Saratoga, CA (US);
David W. Wang, Saratoga, CA (US);
Fibera, Inc., Santa Clara, CA (US);
Abstract
An interference filter ( ) and a process ( ) by which it may be fabricated. A substrate ( ) is provided and a working region ( ) is defined therein or thereupon. Relative to the horizontal substrate ( ), a plurality of vertical layers having differing refractive index are then constructed by applying material into the working region ( ) or altering material already in the working region ( ). Photo masking and etching processes may be used to selectively remove material in the working region ( ) for applying additional material having a differing refractive index. Photo masking and impurity doping processes may be used to selectively change material to have a differing refractive index.