The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2004
Filed:
Dec. 17, 2001
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A shadow mask includes a shadow mask body opposed to a phosphor screen, and its peripheral portion is fixed to a mask frame. The shadow mask body includes a rectangular effective portion that is formed having a large number of electron beam passage apertures. The effective portion has a major axis and a minor axis that pass through its center and extends at right angles to each other. The shadow mask comprises an auxiliary mask fixed to a region that contains the minor axis of the effective portion of the shadow mask body. The auxiliary mask is in the form of a strip that extends long in the direction of the minor axis and has a large number of electron beam passage apertures that communicate individually with the electron beam passage apertures of the effective portion.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile