The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2004
Filed:
Jan. 14, 2003
Applicant:
Inventors:
Kazuya Uenishi, Shizuoka, JP;
Kunihiko Kodama, Shizuoka, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 ;
U.S. Cl.
CPC ...
G03F 7/004 ;
Abstract
A positive resist composition comprising: (A) a polymer having a silicon atom in a side chain thereof, which is insoluble or sparingly soluble in an aqueous alkali solution and becomes soluble in an aqueous alkali solution by an action of an acid; and (B) an acid generator capable of generating an acid on exposure to active light rays or a radiation, which is represented by the formula (I) defined in the present specification.