The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2004
Filed:
Oct. 11, 2001
Applicant:
Inventor:
Thomas J. Drury, Tolland, CT (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 3/00 ; B24D 1/700 ; B24D 1/800 ; B08B 1/04 ;
U.S. Cl.
CPC ...
B24D 3/00 ; B24D 1/700 ; B24D 1/800 ; B08B 1/04 ;
Abstract
A semiconductor polishing device having a substantially cylindrical roller body made of polyvinyl acetal with a uniform material porosity having a mean flow pore pressure ranging from about 0.30 PSI to about 0.35 PSI with 80% of its pores ranging from 7 to 40 microns in size coated with a low viscosity adhesive composition of an appropriately formulated aliphatic or aromatic difunctional polyether urethane methacrylate or formulated multifunctional allphatic urethane acrylate and abrasive particles to form an adhesive skin of about 1 micron in thickness. The abrasive particles typically have a particle size ranging from about 0.05 to about 7 microns and a Mohs' hardness of at least about 7.