The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2004
Filed:
Dec. 11, 2001
Applicant:
Inventors:
Ian G. Cox, Honeoye Falls, NY (US);
Michele Lagana, Honeoye Falls, NY (US);
Assignee:
Bausch and Lomb, Inc., Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02C 7/04 ;
U.S. Cl.
CPC ...
G02C 7/04 ;
Abstract
Wavefront aberration measurements measured in response to design parameter changes in a contact lens, for example, are used to design and prescribe contact lenses offering improved vision quality. In-situ optical performance of trial lenses provides real-time, objectively determined data as a design model for the lenses. Lenses designed by the inventive process are described as well as a method for using an aberrometer to design and prescribe contact lenses.