The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2004
Filed:
Feb. 07, 2001
Ofer Du-Nour, Timrat, IL;
Tevet Process Control Technologies Ltd., Moshava Yokneam, IL;
Abstract
A method or apparatus for measuring lateral variations of a property such as thickness or refractive index of a transparent film on a semiconductor, in a region of repeated patterning comprises: illuminating over the patterned area with a beam of light of multiple wavelengths, the beam having dimensions to include repeated patterning; detecting the intensity of light reflected over the patterned area for each wavelength; producing a signal defining the variation of the intensity of the detected light as a function of the wavelength of the detected light; decomposing the signal into principal frequencies thereof, determining from the principal frequencies, values of the thickness etc. of the transparent film; and applying the values to repetitions within the repeated patterning.