The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2004
Filed:
May. 08, 2002
Applicant:
Inventor:
Josephus J. M. Braat, Eindhoven, NL;
Assignee:
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61N 5/00 ; G21G 5/00 ;
U.S. Cl.
CPC ...
A61N 5/00 ; G21G 5/00 ;
Abstract
A mirror projection system for use in a step-and-scan lithographic projection apparatus, in which a mask pattern ( ) is repetitively scan-imaged on a number of areas of a substrate ( ) by means of a beam (b) of EUV radiation having a cross-section shaped as a segment of a ring, has six imaging mirrors ( ). The design is such that no intermediate image is formed and the system has a negative magnification. When using this projection system in a scanning apparatus, the mask and the substrate move in opposite directions during scanning, which is advantageous from a mechanical point of view.