The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2004
Filed:
Sep. 05, 2002
Antoni Gil Miquel, Barcelona, ES;
Cristina Crespi, Sant Cugat del Valles, ES;
Francisco Guerrero, Barcelona, ES;
Santiago Garcia Reyero, Girona, ES;
Sascha de Peña, Barcelona, ES;
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
One aspect of the invention lowers boundary artifacts by depleting selectively at a boundary, only in high-color-saturation areas. In another aspect, printmasking defines depletion regions. In yet another, a printer treats different drop-to-pass allocations as of opposite sign. Some preferred embodiments exploit the multilayer Shakes mask system: each mask represents a number of drops to fire, and masks are additive, depending on image content. In preferred embodiments the high-value mask is used in opposition, reducing the number of drops to fire. Bits are set in this mask at pixels close to boundaries, to define depletion regions that negate artifact-causing boundary coalescence. An adaptive version measures nonuniformity in an area-fill test pattern, and uses results to define localized depletion bits for high-value mask(s).