The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2004
Filed:
Dec. 16, 2002
J. Michael Drozd, Raleigh, NC (US);
William T. Joines, Durham, NC (US);
Industrial Microwave Systems, L.L.C., Morrisville, NC (US);
Abstract
An elliptical exposure chamber has an extended focal region. A plurality of cylindrical reactors ( ) form the extended focal region. Reducing the size of the opening ( ) to each reactor ( ) reduces the amount of energy reflected and increases the overall heating. In order to efficiently deliver the electromagnetic energy to the reduced opening ( ), a tapered waveguide ( ) has a concave end ( ). A power splitter ( ) divides power from a central waveguide ( ) to the plurality of reactors ( ). The power that is delivered to each reactor ( ) can be adjusted by adjusting the impedance of each reactor ( ), the width of each reactor ( ) or the width of the opening ( ) to each reactor ( ). The width of the opening ( ) to each reactor ( ) can be controlled by a movable metal plate ( ). A dielectric wheel can be used to shift hot spots along the focal region.