The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2004
Filed:
Jul. 25, 2003
Applicant:
Inventors:
Assignee:
Essilor International Compagnie Generale d'Optique, Charenton cedex, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/126 ;
U.S. Cl.
CPC ...
H01L 2/126 ;
Abstract
The invention concerns a method comprising evaporating silicon and/or SiO , wherein said evaporating is further defined as occurring in the presenceof oxygen if silicon or SiO with x less than two is being evaporated, to form a silicon oxide film at the surface of a substrate and in bombarding said silicon film, while it is being formed, with a beam of positive ions derived from both a polyfluorocarbon compound and a rare gas. The invention is useful for producing low-index antiglare films.