The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 28, 2004

Filed:

Jun. 20, 2002
Applicant:
Inventors:

Paul Ferreira, Goucelin, FR;

Phillipe Coronel, Barraux, FR;

Assignee:

STMicroelectronics S.A., Montrouge, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/122 ; H01L 2/138 ;
U.S. Cl.
CPC ...
H01L 2/122 ; H01L 2/138 ;
Abstract

The invention relates to a process for treating a portion of the surface of a substrate according to a first and second surface treatments which are different from each other and are intended respectively for a first group of regions and for a second group of regions of the surface portion, the two groups of regions being mutually complementary with respect to the surface portion, the process making it possible to use only a single operation of positioning a mask which differentiates the regions of the first and second groups of regions, using the same protective materials for the regions of each group of regions against the effects of the treatment intended for the regions of the other group of regions. Application to the fabrication of semiconductor products.


Find Patent Forward Citations

Loading…