The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2004
Filed:
Dec. 20, 2002
Applicant:
Inventors:
YuanQiao Rao, Pittsford, NY (US);
Jehuda Greener, Rochester, NY (US);
Yeh-Hung Lai, Webster, NY (US);
Dennis J. Massa, Pittsford, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/795 ; G03C 1/93 ; B32B 2/706 ; B32B 2/736 ; B29C 5/500 ;
U.S. Cl.
CPC ...
G03C 1/795 ; G03C 1/93 ; B32B 2/706 ; B32B 2/736 ; B29C 5/500 ;
Abstract
This invention relates to a poly(ethylene terephthalate)-based photographic multilayer film base having improved properties with regard to cutting and finishing operations compared to conventional PET film base. A specified amount of monomeric units derived from 1,4-cyclohexanedimethanol (CHDM) is used in at least two layers of the multilayer structure, such that the multilayer film base has a specified cutting related property.