The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6797451 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 28, 2004

Filed:

Jul. 03, 2002
Applicant:
Inventors:

Sung Eun Hong, Sungnam-shi, KR;

Min Ho Jung, Ichon-shi, KR;

Hyeong Soo Kim, Ichon-shi, KR;

Jae Chang Jung, Ichon-shi, KR;

Ki Ho Baik, Ichon-shi, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/76 ;
U.S. Cl.
CPC ...
G03C 1/76 ;

Find Patent Forward Citations

Hong, Sung. (2004). Reflection-inhibiting resin used in process for forming photoresist pattern (U.S. Patent No. 6797451). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6797451

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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