The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2004
Filed:
Mar. 29, 2002
Applicant:
Inventor:
Hakki Ufuk Alpay, Poughquag, NY (US);
Assignee:
Schott Lithotec AG, Jenna, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ;
Abstract
A photomask and method for coating a backside of the same with an antireflective material are disclosed. The photomask includes a transparent substrate with a front-side and a backside. The front-side absorber layer has a patterned absorber layer formed thereon. An anti-reflective layer is deposited on the backside of the substrate. More particularly, the antireflective coating may have a refractive index between 1.4 and 1.8. The anti-reflective layer allows the photomask to reduce unwanted reflections within a lithography system and therefore improve system efficacy and throughput.