The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 28, 2004

Filed:

Jun. 09, 2000
Applicant:
Inventors:

Yaoqi J. Liu, Maplewood, MN (US);

Jeffrey A. Boettcher, Falcon Heights, MN (US);

Heather K. Kranz, Blaine, MN (US);

Andrew T. Ruff, Mendota Heights, MN (US);

Brian L. Koster, Mendota Heights, MN (US);

David K. Mortenson, White Bear Lake, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 2/708 ; B32B 2/716 ; B32B 2/730 ; B32B 2/736 ;
U.S. Cl.
CPC ...
B32B 2/708 ; B32B 2/716 ; B32B 2/730 ; B32B 2/736 ;
Abstract

A birefringent dielectric multilayer film that reflects in a wavelength region of interest, and preferably reflects at least 50% of light in a band at least 100 nm wide, preferably positioned between wavelengths from about 700 nm to about 2000 nm. The film is heat set to render the film capable of shrinking to conform without substantial wrinkling to a substrate having a compound curvature. The film may be laminated to form a wide variety of non-planar articles.


Find Patent Forward Citations

Loading…